Electron beam lithography
The NanoBeam nB5 is documented for electron-beam patterning of chips and wafers. The facility describes CAD-based job preparation and several substrate-holder options. Researchers should establish how the design will be prepared and how the sample will be mounted before comparing exposure approaches or planning an experiment.
Create an account to search detailed equipment records, compare documented capabilities and build a research shortlist. Facility access, project acceptance, rates and scheduling must be confirmed separately.
