Explore selected scientific instruments by model and technique. These public summaries help you assess relevance before exploring detailed records in Abstract.
This initial collection covers 25 instruments documented by a facility in Uppsala, Sweden. It is a selected starting point, not a complete inventory or a live availability service.
Related capability guidesAtomic layer deposition
Uppsala, Sweden
The Microchemistry F120 is documented for depositing metal oxide and sulfide films.
Atomic layer deposition
Uppsala, Sweden
The Picosun R200 is an ALD system with documented oxide and nitride deposition processes.
Atomic force microscopy
Uppsala, Sweden
The PSIA XE150 uses a probe to scan sample surfaces.
Scanning electron microscopy
Uppsala, Sweden
The Zeiss Merlin combines electron microscopy with documented EDS elemental analysis and EBSD crystal-orientation mapping.
Thermal processing
Uppsala, Sweden
The Koyo Lindberg Micro TF-6 is listed as a general-purpose vertical furnace for thermal processing in Uppsala.
Optical surface profiling
Uppsala, Sweden
The ZYGO NexView is an optical profiler whose public description includes coherence-scanning and phase-shifting interferometry.
Auger electron spectroscopy
Uppsala, Sweden
The PHI 710 Scanning Auger Nanoprobe combines Auger chemical analysis with electron imaging.
Two-photon polymerization
Uppsala, Sweden
The UpNano NanoOne 250 builds small three-dimensional structures using two-photon polymerization of photosensitive resins.
Wafer dicing
Uppsala, Sweden
The DISCO DAD3221 is an automatic dicing saw for cutting wafers and substrates.
Direct laser writing
Uppsala, Sweden
The Kloé Dilase 650 is listed as a direct laser writer in the Uppsala facility catalogue.
Electron beam lithography
Uppsala, Sweden
The JEOL JBX-8100FS is documented as an electron beam lithography system for semiconductor nanofabrication.
Electron beam lithography
Uppsala, Sweden
The NanoBeam nB5 is documented for electron-beam patterning of chips and wafers.
X-ray photoelectron spectroscopy
Uppsala, Sweden
The Physical Electronics Quantera II is an XPS/ESCA system for surface chemical analysis.
Focused ion beam and SEM
Uppsala, Sweden
The Zeiss Crossbeam 550 combines a focused ion beam with scanning electron microscopy.
Glow discharge optical emission spectroscopy
Uppsala, Sweden
The Spectruma GDA 750 HR is documented for elemental depth analysis, including work on thin-film solar-cell materials.
Deep reactive ion etching
Uppsala, Sweden
The Tegal 110 S/DE is documented for deep silicon etching using Bosch-type processes, with silicon-oxide etching also described.
Ion beam etching
Uppsala, Sweden
The Scientific Vacuum Systems i6000 Milling System is an ion beam etcher.
Digital optical microscopy
Uppsala, Sweden
The Leica DVM6 is a digital optical microscope with documented two- and three-dimensional measurement functions.
Mask alignment and photolithography
Uppsala, Sweden
The Karl Süss MA6/BA6 is documented for contact lithography and wafer-bond alignment, including backside alignment.
Nanoimprint lithography
Uppsala, Sweden
The Obducat NIL-6 is listed as a nanoimprinter in the Uppsala facility catalogue.
Nanoindentation
Uppsala, Sweden
The CSM UNHT is listed as a nanoindenter for surface analysis in Uppsala.
Spectroscopic ellipsometry
Uppsala, Sweden
The Woollam RC2-XI is documented for spectroscopic ellipsometry, with use described both alongside an ALD reactor and on an external measurement stage.
Stylus profilometry
Uppsala, Sweden
The Dektak 150 measures surface profiles using a contacting stylus.
Transmission electron microscopy
Uppsala, Sweden
The FEI Titan Themis 200 is documented for transmission and scanning transmission electron microscopy, with structural and chemical analysis capabilities.
X-ray fluorescence
Uppsala, Sweden
The Panalytical Epsilon 5 is documented as an X-ray fluorescence system for solid thin-film samples.
