Atomic layer deposition
The Picosun R200 is an ALD system with documented oxide and nitride deposition processes. Its public description includes plasma and ozone processing options. For a proposed project, the useful comparison is the match between your target film, substrate and permitted process, rather than the model name alone. Access requires confirmation.
Create an account to search detailed equipment records, compare documented capabilities and build a research shortlist. Facility access, project acceptance, rates and scheduling must be confirmed separately.
